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NIKON METROLOGY
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MEASURING MICROSCOPES
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INVERTED MICROSCOPES
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MM-400/800 Series Measuring Microscopes
High precision measuring microscopes featuring the latest in digital imaging technology
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Seamlessly integrates digital imaging with industrial metrology The MM-400/800 is a new series of innovative measuring microscopes designed for industrial measurement and image analysis. They integrate key performance features delivering complete digital control for maximum measuring accuracy in demanding industrial environments. The systems support a host of new and expanded features including Nikon's electronic connection hub connection that provides total integration of microscope peripherals managed by Nikon's EMAX2 metrology software. Request more information Key features Seamless integration with Nikon digital cameras and E-max metrology |
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- Improved illuminators
High-intensity white LED illuminator is standard for brightfield use - Backpack interface
Facilitates automated illumination, X/Y stage and Z data control through an external computer running E-Max software - Large stages available
For larger workpiece measuring, up to a 12x8" stage is available
Applications
- MEMS, microelectronics and optoelectronics
- Plastic manufacturing
- Lab-on-a-chip,
- Surface analysis, cracks & failure analysis
- Medical devices
Functionalities
Data processor
The DP-E1 Data Processor is compact, yet easy to use. For quick measurements and data processing you can place the read-out display near the eyepiece while the control pad is placed at your fingertips. The DP-E1's seamless interface to a PC platform makes it easy to perform computations and management of your measurement results.
New 12x8" stage for large workpieces (MM-800 only)
An enhanced body design using Computer Aided Engineering (CAE) for stress analysis enables the mounting of a larger stage to accommodate larger workpieces. A 300 x 200mm (12 x 8 in) stroke stage can be mounted to the MM-800.
High-performance objectives
CFI60 LU Plan Fluor Series: The transmission rate in the UV wavelength range has been improved for the new CFI60 LU Plan Fluor series. These objective lenses are suitable for various research, analysis and examination needs, while maintaining Nikon's commitment to high NA and long working distance. Only one kind of objective lens is needed for brightfield, darkfield, simple polarizing, DIC and UV epi-fluorescence observations. These objective lenses offer high resolution and ease of use.
CFI60 L Plan EPI CR Series Objective Lenses with Correction Ring: The CFI60 series now includes the CFI60 L Plan EPI CR series objectives to cope with the thinner cover-glass used in liquid crystal displays and highly integrated, dense devices. Coverglass correction can be continuously made from 0 mm up to 1.2mm (0-0.7mm and 0.6-1.3mm for 100X) with the correction ring. The 100x objective lens offers 0.85 high NA, while enabling high-contrast imaging of cells and patterns without being affected by the coverglass.
Versatile configurations
The design of the MM-400/800 series measuring microscope has been revamped to provide users with increased flexibility in choosing modules for system configurations. The system can be configured according to your needs, using the extra long toolmaker's objectives (1x to 100x) or the universal system configuration using microscope objectives on a revolving turret. Also the construction of the entire microscope boasts improved rigidity, and offers large high accuracy digital stages. Nikon's legendary construction maintains its excellent reliability and measurement accuracy over years of heavy use.
3rd-party DRO connectable (S models)
The MM-400S, SL and MM-800S, SL models were created for use with Metronics Quadra-Chek and other 3rd-party digital readouts. They offer an economical alternative if non-Nikon data processors are used.
E-Max data processing software
Digital image measuring performance of the E-MAX software has been upgraded. Combined with Nikon's digital camera and measuring microscope, the system achieves digital image measurements with precision never before possible.
TTL laser autofocus
These are the first measuring microscopes to offer an optional TTL Laser Auto-Focus. This Laser AF system features a 0.5 second focusing speed with a repeatability as high as 0.5µm (20x objective 0.75µm spot diameter).
Focusing aid (FA)
The newly developed split-prism Focusing Aid (FA) delivers sharp patterns to allow accurate focusing during Z-axis measurements. Measurement errors due to differences in the depth of focus of different objectives are minimized.
Built-in continuous light control
A continuous light control is built into the system, enabling light control from the PC without touching the dial on the main body to assure measuring repeatability. Measurements can now be made under the same conditions, ensuring precise video edge detection for repeatable automated measurements.
8-segment LED ring light CYN-E1
This ring light enables illumination control from eight directions. It can be computer controlled using E-Max software for measuring repeatability. It allows edge definition and artifacts of difficult to image parts by controlling angle and intensity of the 8 segments.
Motorized Z-axis movement (LM model stands)
A motorized vertical movement mechanism with a 10mm/sec. speed has been incorporated. Up/down control is accurately provided with a dedicated controller.
Digital imaging & vision processing
The use of a Nikon microscope digital camera and E-MAX software will streamline your workflow from observation and capture, to the storage of high-definition digital images of your workpieces.
MM controller backpack interface
Illumination, X/Y stage and Z data can be connected to the MM Controller as an interface to an external computer running E-MAX software for data processing and system control.
White LED illuminator
High intensity white LED illuminators are provided standard for surface and contour illumination. This illuminator features no bulb replacement and constant color temperature, enabling measurement with high-precision and efficiency. For the universal type (except FA), a newly designed 12V/50W halogen light is included. Brightness has been substantially improved, particularly at high magnifications.
Different stands to fit the function
You can select what you need without paying for what you don’t.
The MM400 series handles digital stages up to 6” x 4” and a Z height of 150mm, while the MM800 handles up to a 12” X 6” stage for larger parts with up to 200mm height.
MM400/800 stands for use with Nikon readouts and Emax Data processing software have their encoder boards built-in. S series stands are for use with 3d party Data Processors (Metronics Quadra Check) and are less expensive. Stands which require Z
Axis height measurement are designated with “L” (Linear Encoder) and stands which have motorized Z Axis height are designated with “LM” (Linear Encoder & Motorized).
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MM-200 Measuring Microscopes
Compact and affordable measuring microscope system featuring exceptional quality, accuracy and durability.
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Precise, compact and easy-to-use measuring microscope for dimensioning and tolerancing. Nikon's new MM-200 Measuring Microscope is compact and lightweight with an affordable price for all who require precision and accuracy for measuring a variety of metal, plastic, and electronic parts in all industries; especially automotive and electronics. This powerful new microscope is especially designed and engineered with the machining engineers and inspectors in mind. Request more information |
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Key features
- Compact, space-saving footprint
Main body has been streamlined into a compact design that is 50% smaller than previous models. - C-mount video head
The dedicated C-mount video head (built-in reflective LED illuminator) allows for easy connection with E-Max data processing software. Dedicated monocular optical head also available. - 8-segment LED lighting
Optical LED ring lights provide enhanced edge observation via oblique illumination. - E-Max data processing software
Enables advanced measurement and image processing functions, including automated edge detection
Applications
- Microelectronics and optoelectronics
- Metal and plastic manufacturing
- Automotive manufacturing
- Medical Devices
- Surface Analysis
Functionalities
Compact, space-saving body
The MM-200 features a space-saving design with a footprint of just 420 x 297 mm (main body with monocular eyepiece tube). In addition, the system weighs just 40kg.
New mechanical design for focusing motion control
Focusing motion control mechanics is newly designed to optimize the use of frequently used objective lenses from 1x to 10x.
Built-in stage
No stage installation work is necessary and the footprint has been reduced by 50% compared to existing Nikon MM models.
Eyepiece options
For those who prefer to measure with their own eye, the monocular eyepiece tube is available, while the C-Mount Video Head model provides easy video monitoring.
Contamination protection design
The stage lead screw is sealed in order to protect the MM-200 from contamination generated from the adjacent machinery on the production floor.
High-intensity white light LED
No halogen bulb needs to be changed and light source running cost is reduced since both diascopic and episcopic illuminators employ a high intensity white LED light source.
E-Max data processing software
In combination with Nikon's digital still camera, the DS-2Mv, the new E-MAX series software provides state-of-the-art image processing technology. Automated edge detection with sub-pixel processing enables more precise and repeatable measurement. Effectively used in conjunction with the MM-200, the new E-MAX series software provides the user with various advanced measurements and processing functions, ranging from two-dimensional data processing and image measurements, to data storage.
8-segment LED light sources
The built-in episcopic and diascopic light sources are all long life white LED. The optional LED Ring Lights will produce clear and enhanced edge contrast by oblique and 8-segmented individually ON/OFF lighting.
Controller backpack interface
The MM-200 has the backpack control interface unit for XY stage scale readout, illumination control, communication ports to external devices such as PC, digital readout and more. Simply apply the DP-E1 Data Processing Unit to intricate GD&T measurements. The E-MAX DS-V system allows easy-to-use advanced video edge detection technologies. Popular digital readout instruments, such as Metronics Quadra-Chek300, are also available.
Data processing unit
The DP-E1 Data Processor is compact, yet easy to use for quick measurements and data processing. The DP-E1's seamless interface to a PC platform, makes it easy to perform computations and management of your data.
Digital readouts
The MM-200 can be used with Metronics Quadra-Chek and other 3rd-party digital readouts for Geometric Dimensioning & Tolerancing.
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Eclipse L200N Series Microscopes
Incorporating CFI60 optics for flawless inspection of 200mm wafers and masks.
Combined with Nikon's superior CFI60 LU/L optical system and an extraordinary new illumination system, this microscope provides images with greater contrast, high resolving power and darkfield images three times brighter than before. Used independently, or in combination with wafer loaders, the L200 series performs exceptionally precise optical inspection of wafers, photo masks, reticles and other substrates.
Key features
- Tilting eyepiece tube
The L200's eyepiece tube allows continuous adjustment of the tilt angle from 0° to 30° for viewing at the optimum eyepoint level. - CFI60 optical system
Provide outstandingly clear, sharp images with longer working distances, high numerical aperture (NA) and minimal flare. - Fixed X-Y fine-movement controls
The X-Y fine-movement controls remain in the same position, close to the front, for a comfortable viewing posture regardless of the stage position. - Ergonomic design
Controls and knobs are positioned low and close to the operator while the eyepoint is set at the ideal height for comfortable operation.
Applications
- Wafers
Three models to choose from
- L200: Offers 200mm wafer and mask inspection capabilities for reflected light illumination defect identification with various observation methods such as brightfield, darkfield, simple polarizing and DIC.
- L200ND: Offers 200mm wafer and mask inspection capabilities for both transmitted and relfected light illumination. In addition to the observation methods of the L200N, epi-fluorescence observations including 365nm UV exicitation is possible.
- L200A: Automated version of the L200N. Frequently used operations such as aperture control, focusing, brightfield/darkfield changeover, nosepiece rotation, lamp intensity control, and DIC settings are all motorized and can be controlled by the remote controller or a PC.
Contamination safeguards
The bodies of these microscopes are finished with electrostatic discharge coatings to prevent foreign particles from adhering to the microscope. Furthermore, the motorized nosepiece uses a shielded center motor that traps foreign particles inside, preventing them from falling onto the sample.
High-intensity halogen illumination
The high intensity 12V-50W halogen illuminator, (LV-LH50PC) provides greater brightnessthat than of a 12V-100W halogen illuminator with half the power consumption. This new lamphouse incorporates a rear mirror and optimized lamp filament size to allow effective and uniform illumination on the pupil plane which is critical in an optical plane.
Improved DIC microscopy
Nikon's CFI LU Plan objectives allow the use of multiple observation techniques, including brightfield, darkfield, and Nomarski DIC using a single objective. For DIC, simply insert a single Nomarski prism into the nosepiece that works for all magnification ranges.
SEMI S2-0200, S8-0600 compliant design
Incorporating a SEMI-compliant design, controls and knobs are positioned low and close to the operator while the eyepoint is set at the ideal height for comfortable operation. With the controls located comfortably in the microscope base, hand movement is minimal, allowing concentration on the inspection process. The eyepiece is moved closer to the operator so that he or she can assume a more erect sitting posture. This also positions the operator farther from the stage to provide a more ergonomic and safe viewing position.
Tilting eyepiece tube
The eyepiece tube is of the trinocular tilting type, allowing continuous adjustment of the tilt angle from 0° to 30° for viewing at the optimum eyepoint level. The eyepiece also features an ultra-widefield design and has an F.O.V. of 25mm.
Fixed-position X-Y fine-movement controls
The X-Y fine-movement controls remain in the same position, close to the front, for a comfortable viewing posture regardless of the stage position. In addition, these controls, plus the focus knob, are located close to each other so you can operate both with one hand.
Motorized nosepiece with software control
The motorized universal nosepiece for the L200N series microscope has improved centricity and is three times more durable than conventional models. It also contains an anti flash mechanism to protect the operators eyes when the nosepiece is rotated. The L200A built in motorized nosepiece includes a slot for DIC attachments, features a mechanical click stop and is controlled by software that enables the system to stop precisely at each respective objective position.
CFI60 optical system
Provide outstandingly clear, sharp images with longer working distances, high numerical aperture (NA) and minimal flare. Signal to background ratios during darkfield observations are three times better than before to provide outstanding high contrast images ideal for high precision observations.
Vibration isolation
Applying computer-aided engineering (CAE), Nikon increased the rigidity of the L200 series dramatically, making these microscopes three times less susceptible to floor vibrations when compared with conventional equipment. This, in turn, reduces the chance of unwanted blur or image shifts even during high magnification observations. While this superior design increases stability, it also results in a smaller footprint.
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Eclipse L300 Series Microscopes
New L300N/ L300ND Series: Featuring Nikon's most advanced optics for flawless inspection of large-size LCDs and wafers.
Configured for 300mm wafer and mask inspection, the Eclipse L300N/L300ND Series also satisfies the need for Flat Panel Display backend inspection, which includes the inspection of LCDs. This series utilizes Nikon proprietary CFI60 optical system, offering high resolution, contrast and transmittance. The enhanced Epi-fluorescence function enabling 365nm UV excitation is excellently suited for the inspection of semiconductor residues on 300mm wafers and organic electroluminescence displays. Image brightness has been dramatically improved compared to conventional microscopes, making these microscopes series suitable for various kinds of inspections.
Key features
- Designed for 300mm wafer and mask inspection
- Utilizes CFI60 optical system for higher resolution, contrast and transmittance
- Higher brightness than conventional microscopes
- A new light source and an advanced optical design result in four times brighter diascopic illumination
- A pre-centered lamphouse offers greater brightness, while consuming only half of the power and reducing thermally induced defocus
- Motorized nosepiece that is three times more durable than conventional model
Applications
- Wafers
- Liquid crystal displays
- Various other inspections
Two models to choose from
- L300N: Episcopic Illumination Type
- Maximum sample size: 300mm wafers
- Stage stroke: 354 x 302mm
- Magnification range: 15x – 2000x (depends on eyepiece and objective) - L300ND: Diascopic/Episcopic Illumination Type
- Maximum sample size: 17-inch flat-panel displays (FPD)
- Stage stroke: 354 x 302mm (diascopic illumination range: 354 x 268mm)
- Magnification range: 15x – 2000x (depends on eyepiece and objective)
Wide variety of observation techniques
A wide variety of observation techniques, such as brightfield, darkfield, simple polarizing, DIC and epi-flourescence observation, is possible. Using epi-flourescence observation, UV excitation can be applied to applications including the inspection of 300mm wafers and OLEDs.
Darkfield observation
The newly developed darkfield illumination optics dramatically enhance image brightness and improves detection capability of minute scratches and topographies within a sample.
Brightfield observation
Nikon's CFI60 system – a successful merger of the CF optical system with infinity optics – contributes to bright, high-contrast images.
Nomarski DIC observation
The L300N/300ND adopts a single prism (Senarmont) system, which enables DIC observations at all magnifications by simply inserting a single Nomarski prism into the nosepiece. DIC images are clear and crisp with minimal color shades, even at low magnifications. A high-contrast-type DIC slider permits the formation of DIC images with greater sensitivity.
SEMI-compliant design
The L300N/L300ND complies with Semiconductor Equipment and Materials International (SEMI) guidelines for safety (S7-0703) and ergonomics (S8-1103). As the eyepiece is positioned closer to the operator, the stage does not touch the operator even when it is moved toward him or her, ensuring safe, comfortable viewing.
Stronger safeguards against electrostatic
Electrostatic-discharge coatings have been applied to the body, stage, eyepiece tube (L2-TT2 type), and various controls. This strengthens safeguards against contamination and prevents damage to samples induced by electrostatic, thus contributing to higher yields.
Fixed position X-Y control
The X-Y fine movement control remains in the same position close to the operator, making it unnecessary for the operator to extend his or her arm to move the stage. Because moving the specimen and focusing can be carried out with one hand resting on the desk, the operator can focus on observation.
Easy access controls
The main control knobs and buttons are located in the front of the base to allow quick, easy operation while viewing samples, and minimize fatigue during lengthy observations.
Focusing target
The focusing target moves easily in and out of the optical path to allow easier focusing on low-contrast samples such as bare wafers.
Long working distances and high N.A.'s
Taking advantage of the 60mm parfocal distance, the new series provides longer working distance while maintaining higher numerical aperture. The CFI60 offers both image brightness and ease of operation. Furthermore, optical centricity has been improved to minimize image shifts that might occur when changing the objective magnification.
Tilting trinocular eyepiece tube
The tilting trinocular eyepiece tube is the ultra-widefield FOV 25mm type. The eyepiece angle can be set between 0° and 30°, allowing users to set their optimum eyepoint level to ensure comfortable viewing posture. Two types are available offering different observation/photo optical path ratios: L2-TT2 (100:0 / 20:80) and L2-TT (100:0 / 0:100).
High contrast with minimal flare
The tilting trinocular eyepiece tube is the ultra-widefield FOV 25mm type. The eyepiece angle can be set between 0° and 30°, allowing users to set their optimum eyepoint level to ensure comfortable viewing posture. Two types are available offering different observation/photo optical path ratios: L2-TT2 (100:0 / 20:80) and L2-TT (100:0 / 0:100).
CFI60 optics
The L300 series utilizes the CFI60 optical system – a fusion of Nikon's renowned CF design and the excellent performance of the Nikon infinity optics. The CFI60 offers high resolution, contrast and transmittance, and provides the world's highest level of optical performance. Image brightness has been dramatically improved compared to conventional microscopes, making the new series suitable for various kinds of inspections.
Motorized universal nosepiece
The built-in nosepiece is a universal motorized sextuple type with three centerable slots. Image shifts that occur during magnification change can be minimized by using objectives with improved centricity and a nosepiece with a centering function. Illumination is also momentarily cut to protect the operator's eyes when the nosepiece is rotated.
USB for nosepiece position output
A USB interface is available for nosepiece position output to DS-L2 and U2 as well as control of nosepiece through NIS Elements software and 3rd party software through SDK.
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Eclipse LV100 POL Series Microscopes
Advanced polarized light microscopy under both diascopic and epicscopic illumination
Nikon's Eclipse polarizing microscopes are renowned for their abilitiy to produce brighter, clearer, and higher contrast images. The LV100 POL, available in diascopic and episcopic microscope illumination types, continues this tradition and offers a completely reengineered base for even easier operation. It also features an exclusive high-intensity halogen light source, which delivers brighter images, lower power consumption and less heat generation, thereby reducing the chance of heat-induced focus drift.
Key features
- Diascopic (Transmitted) light source
The new high intensity 50W halogen light source incorporates a fly-eye lens design that outputs more light than a 100W lamp. The greater brightness is achieved by optimizing the lamp filament size and optically expanding the size of the light source within the pupil illumination fulfillment. - Lead and Arsenic Free Objective Lenses
The new CFI LU Plan Fluor EPI P objective series uses eco-glass that is manufactured to the same specifications as Nikon's proprietary infinity optics (CFI60) system, but without harmful substances such as lead and arsenic. - 30mm Focusing Stroke
The focus stroke has been improved to 30mm, facilitating observation of tall samples. - Reversed centering nosepiece
Up to five objectives, ranging from 4x to100x can be mounted to the nosepiece and all five objectives are centerable. The nosepiece is also provided with a DIN compliant compensator slot and it accepts various compensators for advanced quantitative measurements. - Bertrand Lens Incorporated into design of intermediate tube
The Bertrand lens enables both the observation and capture of conoscopic and orthoscopic images. The Bertrand lens is also focusable and centerable. - Rotatable slider type analyzer
The high precision slider-type analyzer located in the intermediate tube is rotatable for a full 360°. - Reduced Focus Drift
Focus drift resulting from light source heat is greatly reduced by virtue of the lower power consumption and heat generated from the new diascopic light source. - Diascopic and Episcopic Polarization
Both Diascopic (transmitted) and Episcopic (reflected) polarization observations are possible by mounting the LV-UEPI universal epi-illuminator. - Episcopic DIC (Differential Interference Contrast)
By mounting the LV-UEPI universal epi-illuminator and optional universal-type nosepiece and DIC accessories including objectives, Episcopic DIC microscopy is possible. - High-Precision rotating stage
The stage is large-sized, pre-adjusted and click-stops in 45° increments, making it extremely accurate and easy to rotate. Because the stage is designed to be supported from the bottom of the microscope near the optical axis and incorporates steel cross roller guides, it is twice as stable and durable as conventional stages. - Vibration resistant stage
The large sized circular stage is supported near the optical axis and incorporates steal cross roller guides making the stage twice as stable and durable as conventional models. The stage is also extremely accurate, centerable to the optical axis, and provides click-stops at 45° increments.
Applications
- Composites, Plastic manufacturing
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Eclipse LV150 Series Microscopes
Digitally-enabled, modular solutions for industrial inspection.
The advanced optics, digital capabilities, and modular design of the Eclipse LV150 Series microscopes allows an unprecedented level of versatility and flexibility that enables them to cover a wide variety of products and applications extending from development and quality control to manufacturing inspection. These microscopes provide superb performance when inspecting semiconductors, flat panel displays, packages, electronics substrates, materials, medical devices, and a variety of other samples.
Key features
- Trinocular tube
Has an optical path changeover of 100:0/0:100 for simultaneous use with a monitor or digital camera system - LV-UEPI2 illuminator
Enables brightfield, darkfield, simple polarizing and DIC observations - CFI LU plan fluor objectives
Feature high NA, long working distances and improved rates in the UV range - Extensive range of stages
Stages have a triple-plate design and are capable of inspecting 150mm wafers (with wafer holder)
Applications
- Metal Manufacturing
- Automotive Manufacturing
- Medical Devices
- Optoelectronics
- Microelectronics
- MEMS
- Wafers
- Liquid Crystal Displays
- Metallurgy
- Fabrics/Textiles
- Composites
Two models to choose from
The Eclipse L150 is the standard model of the line and the Eclipse L150A features a motorized nosepiece. The L150 is ESD safe for the magnetic head industry, while the universal motorized nosepiece and controls make the L150A the perfect microscope for the semiconductor industry.
Ergonomic design
All controls are up-front in the microscope base to minimize hand movement and the eyepoint is set at the optimum level to ensure comfortable observation. A refocusing mechanism also prevents the objective from hitting the sample. The L150A comes standard with a fixed-motorized quintuple nosepiece. Internal software ensures that the nosepiece stops precisely at each objective position. Nosepiece controls are located below the stage to prevent contamination by eliminating the need to place hands in or near the stage area.
Tilting trinocular eyepiece tube
The Tilting Trinocular Eyepiece Tube (erect image) offers comfort to all users regardless of their stature or viewing position and has an optical path changeover of 100:0/20:80 for simultaneous use with a monitor or Digital Camera System. A non-tilting trinocular and binocular eyepiece tube are also available.
Motorized or manual nosepieces
An improved motorized universal quintuple nosepiece with controls is built into the main body of the microscope. Manual nosepieces are available for Universal, Brightfield or Brightfield/Darkfield applications.
Column riser
For thicker samples, a 35mm column riser can be added to the microscopes main body providing a total sample height clearance of 82mm.
Dia base unit for diascopic illumination
The LV DIA Dia Base is available for diascopic illumination suitable for OEM applications. A UN2 transformer is used for the power supply.
Universal Epi-illuminators for reflected light
Choice of brightfield, darkfield, simple polarizing and DIC illumination or complex illumination techniques requiring epi-fluorescence UV excitation or UV polarizing. Illumination is achieved via a precentered 12V/50W lamphouse with output brightness equal to or higher than its predecessor 12V/100W lamphouse.
CFI LU plan fluor and plan fluor BD series optics
In addition to the longer working distance and higher numeric apertures common to Nikon's CFI60 optics, the transmission rate in the UV wavelength range has been improved with the new CFI LU Plan Fluor Series objectives. The CFI LU Plan Fluor BD Series objectives offer both an improved UV transmission rate and brightfield/darkfield application observation.
CFI L plan EPI CR series optics
In addition to the longer working distance and higher numeric apertures common to Nikon's CFI60 optics, cover glass corrections can be made from 0mm up to 1.2mm with the 20x or 50x objectives and from 0mm up to 0.7mm or 0.6mm up to 1.3mm with the 100x objective.
Modular design
The modularity of the microscope provides the ability to design configurations suitable for individual application requirements by offering choices in the stage size (including Non-Nikon stages), epi-illumination systems including BF/DF and fluorescence, optical performance including improved UV transmission and cover glass correction, motorized or non-motorized nosepieces, and binocular, trinocular, or tilting trinocular eyepiece tubes.
Non-Nikon stage accomodation
Use of non-Nikon stages such as the Suruga Seiki B23-60CR, in combination with the LV-Sub substage 2, accommodates sample thicknesses up to 116.5mm.
Extensive range of stages
Both a 3x2 stage and a 6x4 stage come with glass inserts making them both suitable for either Episcopic or Diascopic illumination techniques. The 3x2 stage can also accommodate an ESD plate or slide-glass holder. For larger sample sizes, a 6x6 stage is available. The 6x6 stage can also accommodate an ESD plate or Wafer Holder.
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AZ100 Multizoom Microscopes
A multi-purpose zoom microscope system that provides capabilities that don't currently exist with stereomicroscopes and compound high magnification microscopes.
The AZ100 Multizoom represents a new concept in zoom microscopes. It covers an extremely wide range of magnifications, from 5x to 400x, effectively combining the advantages provided by stereo zoom microscopes and compound microscopes. Thanks to a smooth zooming mechanism and a unique triple nosepiece, the AZ100 can continuously switch magnifications, extending from macro to micro observation of the same specimen.
Key features
- Wide range of magnifications
By combining built-in 8x zoom optics, which provide from 1x to 8x magnification, with a three-position objective nosepiece, the AZ100 enables observation at the highest magnification ratio of any such device in the world. The objective lens lineup consists of 0.5x, 1x, 2x, 4x, and 5x lenses. When combined with AZ-W 10x eyepiece lenses, the AZ100 covers everything from low, though medium to high magnification. In the range of 5x to 500x (the latter includes the 1.25x device magnification of the coaxial illuminator). The zoom knob incorporates an engageable click-stop mechanism for measuring and reproducing magnification settings. - Macro observation by on-axis viewing
True on-axis observation and image capture are possible in the macro region due to the AZ100's elimination of the traditional stereoscope's angular view of the specimen. - Mono zoom mechanism
Stereoscopic microscopes always capture images in a diagonal direction due to the structure of the device. The AZ100, however, captures high-resolution, high-contrast images with on-axis viewing. - Dedicated stages
The product lineup consists of a reflected-only and a dual-purpose reflected/transmitted illumination stage. The three-plate structure of the stage enables stable operation even for observation at high magnification. They provide superior durability even when supporting heavy industrial samples. - Convenient aperture stop
The AZ100 ships complete with an aperture stop that is effective not only for visual observation, but also for the capture of digital images. This aperture stop allows you to freely change contrast and field depth based on your specimen requirements. - Double-coarse/fine Focusing system
Focusing can be done using either the AZ stand or stage controls. Since the stand section offers an 85mm stroke and the stage section a 10mm stroke, even tall samples can easily be observed. Focusing the stage can be performed easily with up-front table-level controls, without having to put your hands above the sample. - Tilting eyepiece tubes
The AZ100 comes standard with eyepiece tubes that tilt from 0° to 30°. This feature enables the optimal eye level for the observer's height and posture as well as the sample height. Two different beam-split ratios for the binocular and photo port can be selected: 100:0/0:100, which is suitable for photo documentation; or 100:0/20:80, which enables visual observation while displaying an image on a monitor. - Stands
Nikon has developed two new extremely stable dedicated stands: a reflected-only and a dual-purpose reflected/transmitted illumination stand. Even during observation at high magnifications, these stands enable stable, blur-free observation.
Applications
- Microelectronics, optotelectronics
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Eclipse i50 POL Microscopes
A compact polarizing microscope that balances optical performance and ease of use.
With its small footprint, the Eclipse 50i POL is a basic polarizing microscope that offers powerful microscope optics and comfortable operation in an affordable package. Available in diascopic and episcopic illumination types, the 50i POL features a newly designed illumination system that provides greater brightness than any microscope in its class.
Key features
- Episcopic DIC (Differential Interference Contrast)
By mounting the LV-UEPI universal epi-illuminator and optional universal-type nosepiece and DIC accessories including objectives, Episcopic DIC microscopy is possible. - Reversed Centering Nosepiece
Up to five objectives, ranging from 4x to100x can be mounted to the nosepiece and all five objectives are centerable. The nosepiece is also provided with a DIN compliant compensator slot and it accepts various compensators for advanced quantitative measurements. - CFI60 Optical system
Nikon's proprietary CFI60 optics provide high NA and a longer working distance. CFI60 optics deliver bright, high-resolution images. Up to five objective lenses can be mounted. - Diascopic and Episcopic Polarization
Both Diascopic (transmitted) and Episcopic (reflected) polarization observations are possible by mounting the LV-UEPI universal epi-illuminator.
Applications
- Composites, Plastic Manufacturing
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Eclipse MA100 Inverted Microscopes
Outstanding materials analysis at all magnification levels.
The MA100 is a new compact inverted microscope designed for the routine observation and analysis of prepped material and metallurgical samples in the automotive, aerospace, medical device and electronics industry. The small size footprint makes it an affordable instrument with outstanding optical performance, ideal for in-line sample inspection for the manufacturing, production and assembly environments that require quality control of materials.
Key features
- Durable stage
The three-plated structure provides stable control and superior durability during observation of heavy samples, including embedded samples that are still mounted on a grinders holder. - CFI60 optics
Nikon's proprietary CFI60 optics provide high numerical apertures and longer working distances, delivering bright, high resolution images. - Polarizer/Analyzer
The single action polarizer/analyzer mechanism can rotate 360 degrees, allowing users to set a polarization direction suited to the sample being observed.
Applications
- Metal Manufacturing
- Automotive Manufacturing
- Metallurg
- Grain sizing
- Cast iron nodularity
- Flake analysis
Powerful NIS-Elements imaging software
Nikon’s NIS-Elements Documentation imaging software package allows users to perform everything from basic image capture to the measurement, analysis, and management of captured images. Users can add a wide array of the plug-ins to basic packages according to their intended use.
Durable stage
Nikon developed the all-new MA-SR Rectangular Stage especially for the MA100. The three-plate structure gives the microscope stable control and superior durability and enables observation of heavy samples, including embedded samples that are still mounted on a grinder's holder.
CFI60 optical system
Nikon's proprietary CFI60 optics provide high NA and a longer working distance. CFI60 optics deliver bright, high-resolution images. Up to five objective lenses can be mounted.
Aperture diaphram
The epi illuminator comes standard with a condenser which enables users to control image contrast and depth of field of the sample.
Adjustable mirror
The Eclipse MA100 ships complete with a mirror for checking objective lenses, which makes observation much more efficient. Now users can verify what objective lens is being used as well as the observation position of the sample in a comfortable position, without having to look beneath the stage.
Polarizes/analyzer
This device makes possible simple polarizing observation, which is effective for samples such as polymer materials. It takes just a single action to engage the polarizer and analyzer in the light path. The polarizer can rotate 360°, allowing users to set a polarization direction suited to the sample being observed.
Integration with digital sight camera system
Nikon Digital Sight cameras are versatile, high-resolution digital systems that enable various configurations consisting of a camera head and a control unit to suit the needs of each sample or application.
- DS-Fi1 High Definition Color Camera Head- features a 5-megapixel CCD that faithfully captures 2,560 x 1,920-pixel high-resolution images. This camera head features frame rates far beyond conventional models with improved image quality and ease of use, including a refined IR cut filter. Advanced functionality and high cost performance are the hallmarks of the DS-Fi1.
- DS-2Mv High Speed Color Camera Head- features a 2-megapixel CCD that displays SXGA video at a high frame rate of 15 fps (max. 30fps). This camera head enables the smooth display of live images and the capture of crystal-clear still images with a high sensitivity. With the exceptionally high frame rates it can even be used for live monitoring.
- DS-U2 PC Based-Control Unit- Offering simple connection via high speed USB 2.0, the DS-U2 controls everything from live image display and capture to advanced image processing and analysis on a computer. It supports a wide range of applications.
- DS-L2 Stand-alone Control Unit- The DS-L2 features a large high-definition LCD and a host of features. There is no need for a PC and monitor, which allows the system to be used with a flick of a switch.
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Eclipse MA200 Inverted Microscopes
Introducing Nikon's most advanced metallurgical microscope
The Eclipse MA200 is an inverted materials microscope with an innovative design that has been optimized for digital imaging and ergonomic efficiency. The MA200 uses integrated intelligence to automatically combine captured images with data on their observation settings for more comprehensive documentation. Additionally, its new and unique box design allows easy access to the sample on the stage and nosepiece, while making the footprint size one third of the conventional model.
Key features
- Optimized for digital imaging
Multiple camera ports allow integration of Nikon digital sight cameras for high resolution image analysis. - Durable design
Box-type main body is compact, rugged and antistatic, which minimizes environmental factors that can affect image quality. - Ergonomic, user-friendly operation
All controls and sliders are are positioned up-front and require a minimal learning curve to operate. - Flexible stage handle
Provides easy observation of large specimens and facilitates multiple image capture for software stitching - Nikon CFI60 optical system
Delivers top optical performance and maximum fields of view in all observation methods.
Applications
- Metal Manufacturing
- Automotive Manufacturing
- Metallurgy
- Grain sizing
- Cast iron nodularity
- Flake analysis
Compact, durable design
The compact design employs internal turrets that keep dust off the illumination filters, maintaining bright uniform illumination. Also, the power supply is built-in to save space.
- Steady box-type main body
- Out-and-out front-operation
- High sample visibility
- Turret-type filter system
- A / P synchronized mechanism
- Aperture diaphragms synchronized with B / D changeover
- Flare prevention mechanism
- Low power-consumption, but brightness is higher than that of 12V-100W.
- Dustproof & antistatic body
User-friendly operation
- Controls - All controls are on the front of the instrument for maximum operability.
- Quick Status Check - The observation position of the objective lens and sample can be checked easily from the microscope's front panel.
- Analyzer/Polarizer Interlock Mechanism - Links the attachment/release of the analyzer/polarizer.
- Brightfield/Darkfield Auto-aperture Switching - The field stop and aperture stop automatically open when switched from brightfield to darkfield. When returning to brightfield observation,the previous field and aperture stop settings are reproduced.
- Flash Prevention Mechanism - Reflection flashes when switching objective lenses are automatically prevented.
World-class CFI60 optical system
Nikon's world-class CFI60 optics provide clear, high-contrast brightfield images and darkfield images with three times the brightness of conventional models.
Features:
- Top optical performance in all observation methods
- Optimized for advanced digital imaging
- Provide flat and sharp images
- Lead-free optical system
- Newly developed metallurgical objectives available
- Extra low magnification objective 1x, 2.5x with excellent flatness
- Top quality high magnification objectives (50x, 100x)
Even illumination
Improved uniformity of illumination delivers clear images, especially for digital imaging.
Wide field of view
The MA200 features a super-wide field of view with an eyepiece diameter of 25mm. With the combination of the newly developed 1x objective lens, a sample of 25mm diameter can be observed in a single field of view.
Image analysis
Nikon's DS-U2 Camera Control Unit and NIS-Elements Imaging Software allow the user to perform everything from basic image capture to the measurement, analysis, and management of captured images.
- Status Display
Displays information such as objective lens magnification and illumination conditions. The calibration data is automatically changed when the objective magnification is changed. This feature makes the measurement function and other optional software modules such as grain sizing and cast iron analysis module in the NIS-Elements easy to use. - Quantitative illumination adjustment.
This is crucial when acquiring the optimum settings for observation, image capture and especially large image stitching, can be made via PC control. - Stitching
Adjacent images can be put together to create an image with a wide field. It is now possible to capture even more vivid images due to the improved uniformity of the illumination system. - Grain Size Measurement
Measures grain size and displays results based on JIS and ASTM standards. - Graphite Nodularity Measurement
Measures the graphite nodularity of ground cast iron and displays results based on JIS nd ASTM standards.
Image capture
- DS-L2 Camera Control Unit
Built-in, high-definition, large 8.4-inch XGA LCD screen lets you view & discuss the sample without the need to look in the eyepieces. - Easily Save/Print Data
Captured images can be saved to USB memory or a CF card. In addition to printing directly via a PictBridge-compatible printer, you can save data onto a server over a LAN. - Status Display
Displays information for the objective lens and illumination conditions. Since the correct calibration data is automatically changed when changing magnification, the DS-L2's simple measurement function can be easily employed. - Quantitative illumination adjustment can be made manually by viewing the voltage value
This is crucial when acquiring the optimum settings for observation and image capture.
Energy saving
The 50W halogen light source realizes the same brightness as the previous 100W light source with only about half the power consumption.
Accessories
- LV series motorized nosepiece
- Abundant sample holder
- DIA pillar
- INTENSILIGHT fiber illumination system
- Magnification module
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SMZ1000 Stereo Microscopes
Combining optical performance, expandability and ergonomy
The SMZ1000, one of Nikon's most advanced stereomicroscopes, incorporates a powerful combination of advanced optical and ergonomic capabilities. With high NA objectives and exclusive Nikon illumination system, the SMZ1000 can handle some of the same advanced imaging techniques that compound instrument users have long enjoyed.
Key features
Applications
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10:1 zoom ratio
The SMZ1000 features a large 10x zoom ratio, extending from 0.8x to 8x. This gives you a total magnification from 4x to 480x, depending on the combination of eyepiece and objective used. The zooming knob features clickstops, eliminating the need to remove your eyes from the eyepiece while changing magnification.
High N.A. objectives
In pursuit of sharper and brighter images, Nikon has developed a series of objectives featuring high NA's and high resolving power. One objective, the Plan Apo 1x, boasts NA of 0.1 and a resolving power of 300 lines/mm to produce images that are tack-sharp and display optimum contrast with a minimum of flare, right out to the periphery.
Distortion reduction
We tackled the problems usually associated with stereoscopic microscopes, namely chromatic aberration and distortion in the lens that cause surface irregularities in the image, and solved both to a high degree. Now you can view stereoscopic images that appear undistorted in all their brilliant, true-to-life colors.
Eyepiece tube inclination
The standard binocular eyepiece tube is inclined 20°, allowing you to observe samples without having to lean forward. This reduces fatigue during long hours of operation by reducing strain on your neck, shoulders, and back.
Eyepiece tube options
In addition to the standard type, you have the option of using a low eye-level or tilting binocular eyepiece tube. The low eye-level binocular eyepiece tube enables comfortable observation even when using a diascopic stand or when an intermediate tube is inserted. The tilting binocular eyepiece tube allows adjustment of the eyepiece inclination between 0° and 30° and the eye level can be adjusted 157mm (6.2 in) by swinging the eyepieces up 180° as well as tilting them. You can even add eye-level risers to customize your microscope to your height – up to three risers for a total of 75mm.
Photographic capability
A beam splitter makes the SMZ1000 compatible with a variety of photographic systems: digital, 35mm, as well as analog or digital video systems.
Epifluorescence attachment
Nikon developed an epi-fluorescence attachment, model P-FLA2, for stereoscopic microscopes that allows easy observation of living cells under the fluorescence method such as GFP. Switching between the fluorescence method and brightfield method is quick and easy. Four filter blocks can be switched using a slide lever. If you add an optional photo port to this attachment, you can mount a photomicrographic system or a CCTV camera without using a beam splitter. Because 100% of the light is delivered to the photo port, bright images are guaranteed.
Episcopic illuminator
The SMZ's coaxial episcopic illuminator uses a 12V/100W fiber-optics light source – the same light source used in fiber illuminators – to deliver bright illumination over the entire sample surface. The thickness of the 1/4-lambda plate has been reduced, minimizing spherical aberrations in high NA objectives.
OCC illumination system
Nikon's exclusive Oblique Coherent Constrast (OCC) Illumination System delivers colorless and transparent samples to be observed in high relief. Refractive index differences can be observed to 1/30 of the wavelength of light.
Focusing unit
The C-FMC Focusing Mount C comes with a coaxial coarse/fine-focusing unit that travels smoothly along the optical axis. Its anti-backlash mechanism makes fine adjustment of focus easier and more accurate.
Diascopic stands
The Diascopic Stands, models C-DSD, C-DSS, and C-BD, each have a built-in power supply in a space-saving design. These stands also feature their own fine focus knob at the front of the streamlined base – in addition to the one at the focusing mount – to easily make critical adjustments of focus, especially during micromanipulation. Furthermore, their stage glass diameter is a generous 180mm (7.1 in), making it possible to view samples in large Petri dishes all the way out to the periphery.
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Shuttlepix Portable Digital Microscopes
The ShuttlePix P-400R is based on a new shuttle concept allowing much easier remote inspection for samples, an idea which originally was considered to be too difficult for large scale products. This will allow not only Industrial applications to be the target but also an effective solution for many other practical, imaging problems.
Product overview
In the past, microscopes were used to inspect numerous samples such as electronic and, moulded parts, and all Industrial materials. However in recent years, there has been growing demand to inspect parts and assemblies from Automobile, Boat, Airplane for both engines and airframe, plant pipe line and structures, Art work Restoration and conservation requires fine image recording and inspection without moving the sample.
The ShuttlePix P-400R allows the observer to inspect in a conventional way but also record samples that are difficult or impossible to observe under a conventional microscope. An object can be inspected on site and in it’s correct position without any risk of damaging it.
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Hand-held example : P-400R
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Main features
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1. Shuttle style The ShuttlePix P-400R allows the removal from the Motorized Focusing Stand Controller providing the possibility to capture images under different conditions with cordless operation. By adapting the ShuttlePix P-400R onto the Motorized Focusing Stand Controller and in combination with the 17" touch panel monitor, image capturing can be easily completed. 2. Easy operation The ShuttlePix P-400R allows for simple operation, just like a compact digital camera. For this reason, even without experience or knowledge on how to use a microscope, the observer can easily capture fine images of the sample. |
 
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3. 20x Optical zoom covering from low to high magnification An LED illuminator is integrated with the ShuttlePix P-400R in a compact body with 20x iptical zoom lens. It is capable of observing a wide rage of magnifications between 20x-400x (*) without the need to change a lens. 4. Observation of all-in-focus image, 3D image By attaching the ShuttlePix P-400R onto the Motorized Focusing Stand Controller, all-in-focus images can be created easily using the control buttons. Then by using a dedicated Application software, the creation of reports and 3D image observation, measurement is possible. |
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* magnification on dedicated 17" Monitor
Technical specifications
| Zoom camera head | |
| Magnification | 20x～400x （17inch Monitor） |
| Optical zoom ratio 20:1 | |
| CCD | 1/1.8 inch color CCD |
| Total number of pixels Approx 2.11Mp | |
| Effective pixels Approx 1.98Mp | |
| Storage format | TIFF, JPEG (Compressibility 3steps） |
| Storage media | SD Memory Card |
| LCD Monitor | 2.7inch color LCD monitor (960x240） |
| Light source | White light LED |
| Capable of choosing 4 illumination directions | |
| Actual FOV | Max φ20mm |
| Working Distance | 29mm |
| Tool function | Scale display |
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| Motorized focusing stand | |
| Z axis stroke | 150mm （Motorized control） |
| Maximum sample size |
75mm (W) x 32mm (D) x 148mm (H) ＊Depends on combination with stage |
| Tool function | EDF (Extended Depth of Focus), Measurement, Grid indication, Scale indication etc. |
| Storage media | USB memory |
| ＊P-400R Also possible to choose SD memory card slot | |
| Touch screen monitor | |
| Display size | 17inch |
| Resolution | SXGA (1280x1024) |
The information is current as of the date of publication. It is subject to change without notice.
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